发明名称 |
ANTI-REFLECTIVE COATING PROCESS AND APPARATUS |
摘要 |
A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent. The system also includes a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product, and a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating. |
申请公布号 |
WO0151679(A3) |
申请公布日期 |
2002.02.21 |
申请号 |
WO2001US00869 |
申请日期 |
2001.01.11 |
申请人 |
INFINEON TECHNOLOGIES NORTH AMERICA CORP.;INFINEON TECHNOLOGIES RICHMOND LLP |
发明人 |
ROBERTS, WILLIAM R.;STROBL, MARLENE |
分类号 |
B05D1/34;G03F7/09;G03F7/16;H01L21/027 |
主分类号 |
B05D1/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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