发明名称 |
PLATING DEVICE AND PLATING LIQUID REMOVING METHOD |
摘要 |
PURPOSE: To easily and rapidly remove a plating liquid remaining in an abutment part of a substrate holding section with a substrate to necessitate a simple structure and smaller floor area. CONSTITUTION: This device has a head section 47 provided with a freely rotatable housing 70 having the substrate holding section 72 for holding the substrate W, a plating treating vessel 46 which is arranged below the head section 47 and holds the plating liquid 45 and a plating liquid removing means 300 which removes the plating liquid sticking to the abutment part 360 or the vicinity of the housing 70 with the substrate at the inner peripheral end of the substrate holding section 72.
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申请公布号 |
KR20020013449(A) |
申请公布日期 |
2002.02.20 |
申请号 |
KR20010047919 |
申请日期 |
2001.08.09 |
申请人 |
EBARA CORP. |
发明人 |
SENDAI SATOSHI;TOMIOKA KENYA;TSUDA KATSUMI |
分类号 |
C23C18/38;C25D7/12;C25D17/00;C25D21/00;H01L21/288;H01L21/768;(IPC1-7):C23C18/38 |
主分类号 |
C23C18/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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