OPTICAL PROXIMITY CORRECTION METHOD USING SERIF HAVING VARIABLE DIMENSIONS

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a mask for optically transferring flat plate patterns including plural forming objects respectively having corresponding edges and vertexes onto a substrate by using an optical exposure tool. SOLUTION: This method includes a step of forming the serifs of a rectangular shape at the plural vertexes included in the flat plate patterns and a step of respectively individually determining the dimensions of the respective serifs in accordance with the lengths of the edges of the forming objects in contact with the prescribed vertexes and the horizontal and vertical distances of the prescribed vertexes up to the edges of the nearest forming objects. The positions of the respective sides of the specific serifs are made individually regulatable with respect to the length of the remaining sides of the specific serifs.