METHOD FOR ELIMINATING IMPURITIES OF COOLING LINE OF EQUIPMENT FOR FABRICATING SEMICONDUCTOR

摘要

PURPOSE: A method for eliminating impurities of a cooling line of equipment for fabricating a semiconductor is provided to make a smooth flow of coolant in the cooling line and to maintain a desired optimum temperature of the equipment, by supplying a chemical cleaner to the cooling line to remove the scale attached to the inside of the cooling line. CONSTITUTION: The coolant in the cooling line is eliminated. The chemical cleaner for removing the scale is supplied to the cooling line for a predetermined interval of time. The chemical cleaner is removed after the predetermined interval of time. Deionized water is supplied to the cooling line to completely eliminate the residual chemical cleaner in the cooling line.