发明名称 HIGH FREQUENCY ELECTRODE AND PLASMA TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a high frequency electrode in which the influence on the nodes of standing waves generated in a high frequency transmission line is suppressed and to provide a plasma treating apparatus with which satisfactory treatment free from the generation of a plasma distribution is made possible by using the same. SOLUTION: In the high frequency electrode 1 to be fed with high frequency electric power, recessed parts 2 are formed, and a high frequency transmission line is formed so that high frequency electric power is transmitted from the surface 1a of the high frequency electrode to the surface 1a through the inside surface 2b of the recessed part 2. The recessed parts 2 are formed in the vicinities of the positions of the nodes of standing waves generated in the high frequency transmission line, and the nodes of the standing waves are hidden into the recessed parts 2.
申请公布号 JP2002053968(A) 申请公布日期 2002.02.19
申请号 JP20000236207 申请日期 2000.08.03
申请人 SHARP CORP 发明人 TAKEUCHI HIROAKI
分类号 H05H1/46;C23C16/509;H01L21/205 主分类号 H05H1/46
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