| 摘要 |
PROBLEM TO BE SOLVED: To form a uniform high frequency discharge plasma on a glass substrate 10 in a plasma CVD apparatus in which the glass substrate 10 is treated. SOLUTION: Fine rugged faces are formed on the surface to the deposited with thermal spraying metal on the mounting face 1a of a mounting board 1 subjected to mechanical working in such a manner that the gaps in a wide area with a glass substrate 10 caused by the waviness 13 of the mounting face 1a are buried, the capacitance in the depth of the recessed parts is made uniform, and the impedance is made uniform to the earthing path of each part on the glass substrate 10. |
