发明名称 PHOTORESIST RELEASING LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a photoresist releasing liquid which is excellent in release properties and corrosion resistance, and can easily be handled from the viewpoint of safety. SOLUTION: The photoresist releasing liquid comprises (a) 45-85 wt.% of a specific alkylhydroxylamine, (b) 3-40 wt.% of a water-soluble organic solvent, preferably a specific alkanolamine, (c) 3-20 wt.% of an aromatic hydroxy compound, and (d) the rest of water.
申请公布号 JP2002053775(A) 申请公布日期 2002.02.19
申请号 JP20000240955 申请日期 2000.08.09
申请人 TOKYO OHKA KOGYO CO LTD 发明人 YOKOI SHIGERU;WAKIYA KAZUMASA
分类号 C09D9/00;(IPC1-7):C09D9/00 主分类号 C09D9/00
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