发明名称 Navigation using 3-D detectable pattern
摘要 According to one aspect of the disclosure, the present invention provides methods and arrangements for milling the substrate of a semiconductor device to expose a selected region in the substrate, wherein the semiconductor device has a grid formed in the device to provide lateral and depth position indication during an etch/milling process. In an example implementation, the grid is three dimensional and is used during device analysis for navigation while removing substrate to access a selected circuit area via the backside of flip-chip device. As substrate is removed, the tools are aligned as indicated by the grid.
申请公布号 US6348364(B1) 申请公布日期 2002.02.19
申请号 US19990383733 申请日期 1999.08.26
申请人 ADVANCED MICRO DEVICES, INC. 发明人 BRUCE VICTORIA J.;STEVENSON LESLIE;MORRISSEY KENNETH J.;BACHAND CHARLES
分类号 G01R31/28;(IPC1-7):H01L21/44;H01L21/48;H01L21/50 主分类号 G01R31/28
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