发明名称 |
Navigation using 3-D detectable pattern |
摘要 |
According to one aspect of the disclosure, the present invention provides methods and arrangements for milling the substrate of a semiconductor device to expose a selected region in the substrate, wherein the semiconductor device has a grid formed in the device to provide lateral and depth position indication during an etch/milling process. In an example implementation, the grid is three dimensional and is used during device analysis for navigation while removing substrate to access a selected circuit area via the backside of flip-chip device. As substrate is removed, the tools are aligned as indicated by the grid.
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申请公布号 |
US6348364(B1) |
申请公布日期 |
2002.02.19 |
申请号 |
US19990383733 |
申请日期 |
1999.08.26 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
BRUCE VICTORIA J.;STEVENSON LESLIE;MORRISSEY KENNETH J.;BACHAND CHARLES |
分类号 |
G01R31/28;(IPC1-7):H01L21/44;H01L21/48;H01L21/50 |
主分类号 |
G01R31/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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