发明名称 MANUFACTURING SYSTEM OF THICK FILM/THIN FILM HYBRID MULTILAYER WIRING BOARD AND ELECTRON BEAM LITHOGRAPHY SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To prevent connection failure, and at the same time to achieve the high density of not only an upper thin-film circuit but also thick-film one by providing a matching layer that absorbs the misalignment between circuits at the interface between a thick-film wiring board and a thin-film wiring circuit formed at the upper portion and electrically connects terminals. SOLUTION: A ceramic thick-film wiring board 10 is equipped with five aluminum substrates 11, an inner-layer conductor 12 and an alignment mark 15 of a surface are printed by paste such as tungsten and molybdenum on such aluminum substrate 11, and a via part 13 is formed in the thick-film wiring board 10. On the backside of the thick-film wiring board 10, a land 14 is formed while the via part 13 being exposed from the backside is covered. Also, on the surface of the thick-film wiring board 10, a connection conductor pad 16 is formed while electric connection is made to the via part 13 being exposed from the surface. The connection conductor pad 16 can be used as a matching layer 62 for carrying out the matching connection between a conductor 22 for wiring in a thin-film wiring board 20 being formed on the pad and the via part 13.</p>
申请公布号 JP3258312(B2) 申请公布日期 2002.02.18
申请号 JP20000152731 申请日期 2000.05.19
申请人 发明人
分类号 G21K5/04;G03F7/20;H01L21/027;H01L23/12;H05K3/10;H05K3/46 主分类号 G21K5/04
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