| 摘要 |
Apparatus (2) for monitoring thermal events comprises an array of receptacles (4) for containing material to be monitored wherein each receptacle (4) is thermally isolated from each other receptacle. A respective thermistor (6) is provided in each receptacle and each thermistor is linked to a central control unit (10). The thermistors are used to monitor minute changes in temperature of materials within the receptacles. The apparatus may be used to monitor any process, whether physical or chemical, that involves a heat change. |
