VIEW PORT OF CHEMICAL VAPOR DEPOSITION APPARATUS FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A view port of a chemical vapor deposition apparatus for manufacturing a semiconductor is provided to increase endurance and to improve production yield, by easily observing the inside of a chamber through a window and by remarkably lengthening a cleaning period caused by contamination of the window. CONSTITUTION: A predetermined size of an opening(11) is formed in a side of the side surface of the second electrode(10) constituting the outer wall of the chamber, and a bracket(20) is so formed that the outer circumferential portion of the opening is protruded. The window(30) is inserted into the bracket, and is closely adhered to the outer circumferential portion of the opening by an O ring(31). A cap unit(40) is formed along the end portion of the outer circumference of a hole(21) opening a side surface of the bracket. One end of the cap unit is hinge-coupled to a corresponding end portion of the outer circumference of the bracket, and the other end of the cap unit is detachably connected to a corresponding end portion of the bracket by a lock unit(41). An adiabatic unit(50) is closely and simultaneously adhered to the hole formed on the outer side surface of the bracket and the one surface of the window while adhered to the inner side surface of the cap unit.