POSITIVE TYPE CHEMICAL AMPLIFICATION RESIST AND ITS PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positive type chemical amplification resist using far ultraviolet light having <=220 nm wavelength as light for exposure, capable of preventing the falling and crumbling of a pattern and excellent in adhesion to a substrate and to provide a resist pattern forming method. SOLUTION: A resist pattern shape improver comprising a steroid compound is incorporated into a positive type chemical amplification resist by 0.5-8 pts.wt. based on 100 pts.wt. resin for a resist in the positive type chemical amplification resist. The steroid compound is, e.g. a cholic ester.