| 摘要 |
PROBLEM TO BE SOLVED: To suppress a fogging phenomenon, to reduce the dispersion of dimensions after development and to obtain the one good in dimensional precision in the etching working, in the method for producing etched parts in which a resist composed of a water soluble photosensitive material containing water soluble high polymers and alkali bichromate is applied on a metallic base material, exposure and developing are performed, and, after that, the metallic base material exposed from the resist is subjected to etching. SOLUTION: In this method for producing etched parts, before the application of a resist, the surface of a metallic base material is subjected to surface treatment with ethylenediaminetetraacetic acid or the salt thereof. |
