发明名称 |
LENS SYSTEM, ESPECIALLY, PROJECTION LENS SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY |
摘要 |
PROBLEM TO BE SOLVED: To provide a lens system where a new error is not made after a lens is exchanged and recombined or which is recombined as a result so that the system can be recycled. SOLUTION: In the case of the lens system having many optical elements the same as lenses mounted in mounts combined with each other by an adjusting ring on a proper condition, especially, the projection lens system for semiconductor lithography, the internal mount of at least one of the optical elements intended to be removed and/or combined later is combined with an external mount by three-point attachment.
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申请公布号 |
JP2002048963(A) |
申请公布日期 |
2002.02.15 |
申请号 |
JP20010179885 |
申请日期 |
2001.06.14 |
申请人 |
CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS |
发明人 |
OSTERRIED KARLFRID |
分类号 |
G02B7/02;G03B21/14;G03F7/20;(IPC1-7):G02B7/02 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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