发明名称 LENS SYSTEM, ESPECIALLY, PROJECTION LENS SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide a lens system where a new error is not made after a lens is exchanged and recombined or which is recombined as a result so that the system can be recycled. SOLUTION: In the case of the lens system having many optical elements the same as lenses mounted in mounts combined with each other by an adjusting ring on a proper condition, especially, the projection lens system for semiconductor lithography, the internal mount of at least one of the optical elements intended to be removed and/or combined later is combined with an external mount by three-point attachment.
申请公布号 JP2002048963(A) 申请公布日期 2002.02.15
申请号 JP20010179885 申请日期 2001.06.14
申请人 CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS 发明人 OSTERRIED KARLFRID
分类号 G02B7/02;G03B21/14;G03F7/20;(IPC1-7):G02B7/02 主分类号 G02B7/02
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