| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor resistive element and a production method therefor, with which high resistance can be provided, while making the semiconductor resistor microscopic in size. SOLUTION: This semiconductor resistive element has a channel-forming layer 4 for forming the current channel of the resistor; a first semiconductor layer which is formed on the channel forming layer 4 and provided with a carrier supplying layer 5b, containing a first conductive impurity for supplying electric charges through a heterojunction, with the relevant channel forming layer to the current channel close to the relevant heterojunction; and a second semiconductor layer 5a which is formed on the first semiconductor layer and provided with a second conductive semiconductor area 10, containing a second conductive impurity for controlling the supply of the electric charges from the carrier supplying layer 5b to the current channel.
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