PARTICLE REMOVAL AND CHLOROFLUOROCARBONS COMPOUND DECOMPOSITION SYSTEM USING MIDDLE FREQUENCY PLASMA SOURCE

摘要

PURPOSE: A particle removal and chlorofluorocarbons compound decomposition system using middle frequency plasma source is provided, which uses only impedance matching without installing any independent plasma generating room of inductively coupled plasma method. CONSTITUTION: The system comprises a plasma generating part(160) that is installed between a main process room(100) and an exhaust pump(150) and consists of a 1st insulating connecting part(130a), a 2nd insulating connecting part(130b), a cathode exhaust pipe(130), an anode bar(140) and power supplying device(160) of medium frequency to apply anode power to anode bar(140) through anode electrode part(160a) and to apply cathode power to cathode exhaust pipe(130) through cathode electrode part(160b). To the cathode exhaust pipe(130) at least one of gas inducing pipe(170a,170b) is installed to neutralize and control pressure of gas in the pipe(130).