| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination device, capable of regulating telecentric characteristics of a luminous flux on a wafer, without reducing the utility efficiency of an illumination light. SOLUTION: A pipe 6 is moved in a direction perpendicular to the optical axis to displace a light intensity distribution on its light-emitting surface 6b. Thus, the position of the center of gravity of the light intensity distribution on a light incident surface 9a of a multiple-beam generating means 9 is displaced via a focusing system 8. Thus, the telecentric characteristics of an axial imaging luminous flux of the luminous flux can be regulated on the wafer.
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