| 摘要 |
PROBLEM TO BE SOLVED: To improve anti-contamination effects, exposure light transmittance and running cost by effectively reducing a generation of an impure substance or ozone in a method for exposing, in a method for manufacturing a device using the same, in an aligner and in an apparatus for manufacturing a device using the same. SOLUTION: The method for exposing comprises the steps of supplying gas, to at least one space formed between an exposure energy generation source 1 and a substrate W, and of regulating a flow rate of the gas suppled to the space, in response to incident conditions of an exposure energy IL incident to the space. Thus, the gas flow rate can be suitably controlled, to fully prevent generation of the ozone or adhesion of impure substance in response to the incident conditions, the contamination can be effectively prevented in response to the incident conditions of the exposure energy, and a waste of the gas supply amount can be reduced.
|
