| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a wafer observation position designating apparatus and a wafer display position designating method, which can move the observation position to a desired position with a single operation, when a wafer surface is observed. SOLUTION: The apparatus includes image pick-up means 18 and 19 for photographing the surface of a wafer, a display means 12 for displaying an image photographed by the image pick-up means, an input means 11 for designating a given position displayed by the display means 12 with a position on the display to input positional information, a conversion means (information processing means 112) for converting the input positional information to positional information on the wafer surface, and a moving means (drive means X110 toθ106) for moving the display position on the basis of the converted positional information on the wafer surface, so as to display an image at the display position after the movement.</p> |
