| 摘要 |
PURPOSE: A lithographic projection apparatus is provided to better maintain isotherm of its components. CONSTITUTION: A lithographic apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame on which position sensors for at least one of the patterning structure and substrate are mounted, a vacuum chamber enclosing at least one component selected from a group comprising the support structure, the substrate table, the projection system and the isolated reference frame and at least one temperature control member that at least partially surrounds one of the components in the vacuum chamber, the temperature control member being at least partly formed of a material having at least partly a substantially absorption and emission-inhibiting surface finish for keeping the one component substantially isothermal during operation.
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