发明名称 MICROETCHING AGENT FOR COPPER OR COPPER ALLOY AND MICROETCHING METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a microetching agent for copper or a copper alloy improvded in adhesive properties with resin and free from brown or black precipitates even in the case copper or an copper alloy is continuously treated and to provide a microetching method using the same. SOLUTION: This microetching agent for copper or a copper alloy is composed of an aqueous solution containing the main agent composed of sulfuric acid and hydrogen peroxide and auxiliaries composed of phenyltetrazole and a chlorine ion source, and in the microetching method, the surface of copper or a copper alloy is brought into contact with the above microetching agent and is etched by 0.5 to 3μm, and the surface is roughened.
申请公布号 JP2002047583(A) 申请公布日期 2002.02.15
申请号 JP20000229472 申请日期 2000.07.28
申请人 MEC KK 发明人 KURII YOSHIHIRO;KAMEDA ETSUJI;NAKAMURA SACHIKO
分类号 C23F1/18;H05K3/38;(IPC1-7):C23F1/18 主分类号 C23F1/18
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