发明名称 HIGH PERFORMANCE ELECTROLESS PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a high performance electroless plating method comprising a new plating process which does not use palladium as a catalyst for electroless plating at all for solving the problems relating to the unstability in the feed and the high cost of palladium. SOLUTION: This high performance electroless plating method in which electroless plating is applid on the surface of a nonconductive material with mixed hydroxide as a catalyst has a catalyst applying stage in which, in a colloidal solution containing the mixed hydroxide of nickel and copper, the mixed hydroxide is applied on the surface of a nonconductive material, a reducing stage in which the nonconductive material is charged to the inside of a solution containing a strong reducing agent, and reducing treatment for the mixed hydroxide is performed, a reducing solution cleaning stage in which the nonconductive material is dipped into a reducing solution containing a reducing agent same as that contained in an electroless plating bath, and the surface of the nonconductive material is cleaned with the reducing solution and a plating stage in which the nonconductive material is subjected to plating treatment in the electroless plating bath without being subjected to water washing.
申请公布号 JP2002047574(A) 申请公布日期 2002.02.15
申请号 JP20000227525 申请日期 2000.07.27
申请人 ISHIKAWA KINZOKU KOGYO KK 发明人 TSURU YUTAKA;OYAGI YASHICHI
分类号 C23C18/31;C23C18/34;C23C18/40;(IPC1-7):C23C18/31 主分类号 C23C18/31
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