METHOD FOR PRODUCING TITANIUM OXIDE THIN FILM

摘要

PROBLEM TO BE SOLVED: To deposit a uniform titanium oxide film on a base material by a plasma CVD method. SOLUTION: This method comprises a plasma generating process for generating plasma by discharging rare gas and gaseous oxygen by a discharging means and a film deposition process for depositing a titanium oxide film on a base material by reacting plasma generated by the plasma generating process with a gaseous starting material containing titanium. In the method, the plasma generating process and the film deposition process are performed separately at other placed.