| 摘要 |
PROBLEM TO BE SOLVED: To enhance the write-in accuracy of exposure with a simple configuration. SOLUTION: The exposure device 10 has a turntable 14 to suck and support a glass substrate 12, a laser beam irradiating mechanism to irradiate the exposure region S of the glass substrate 12 with a laser beam for write, and a focal point controller to control the focal point of the laser beam irradiating mechanism by irradiating the glass substrate 12 with a laser beam for control and detecting the quantity of reflected light. The quantity of light reflected on the upper surface of the turntable of the laser beam for control is prevented from being fluctuated by a negative pressure introducing hole 50, by forming the negative pressure introducing hole 50 in a position corresponding to the non-exposing region H of the glass substrate 12 in the upper surface 14A of the turntable 14 so as to apply a negative pressure on the undersurface 12A side of the glass substrate 12.
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