发明名称 PROCESS FOR PRODUCING DISILICON HEXACHLORIDE
摘要 An exhaust gas discharged from a furnace for producing polycrystalline silicon from a chlorosilane and hydrogen is condensed to separate the hydrogen. The resultant condensate is distilled to separate the unreacted chlorosilane and by-product silicon tetrachloride and is then further distilled to recover disilicon hexachloride. Tetrachlorodisilane can be recovered together with the disilicon hexachloride. The disilicon hexachloride and tetrachlorodisilane recovered have a far higher purity than the conventional ones produced from metallic silicon.
申请公布号 WO0212122(A1) 申请公布日期 2002.02.14
申请号 WO2001JP06450 申请日期 2001.07.26
申请人 MITSUBISHI MATERIALS POLYCRYSTALLINE SILICON CORPORATION;KIRII, SEIICHI;NARUKAWA, MITSUTOSHI;TAKESUE, HISAYUKI 发明人 KIRII, SEIICHI;NARUKAWA, MITSUTOSHI;TAKESUE, HISAYUKI
分类号 C01B33/03;C01B33/035;C01B33/107 主分类号 C01B33/03
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