发明名称 Thin film coating apparatus and method, and method for producing liquid crystal display device
摘要 Disclosed is a method for producing liquid crystal display devices comprising a step for forming a transparent electrode and a circuit element of semiconductor on the surface of a pair of transparent substrates, and various steps for applying a photoresist, exposing to the light, etching, releasing the photoresist, inspecting the electrodes and circuit elements of semiconductor, forming an insulating film, forming an alignment film, rubbing the alignment film, spreading spacers, applying a sealing agent, fabricating a cell, filling a liquid crystal, pasting a polarizing plate, and connecting a driver IC characterized in that a soft X-ray is irradiated to the substrate in at least one step prior to the rubbing of the alignment films to produce liquid crystal display devices, at a high yield, in which devices number of pixel defect is small.
申请公布号 US2002018966(A1) 申请公布日期 2002.02.14
申请号 US20010964660 申请日期 2001.09.28
申请人 TANIOKA SATOSHI;MURATA SHIZUO;KONO MAKOTO;HIRANO MASAYUKI 发明人 TANIOKA SATOSHI;MURATA SHIZUO;KONO MAKOTO;HIRANO MASAYUKI
分类号 G21K5/10;B05C9/14;C09K19/06;G02F1/13;G02F1/1333;G02F1/1337;G09F9/00;(IPC1-7):G02F1/133;B05C9/08 主分类号 G21K5/10
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