| 摘要 |
<p>An end-effector (10) includes multiple vortex chucks (12) for supporting a wafer (22). Vortex chucks (12) are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector (10) has limiters (30, 31) to restrict the lateral movement of a supported wafer. In one example, the end-effector has a detector (36A, 36B) for detecting the presence of a wafer. The detector (36A, 36B) is mounted at a shallow angle to allow the end-effector to be positioned close to a wafer to be picked up, thereby allowing detection of deformed wafers contained in a wafer cassette. The shallow angle of the detector also minimizes the thickness of the end-effector. Also disclosed is a wafer station (50) with features similar to that of the end-effector.</p> |
