发明名称 Stereolithographically marked semiconductor devices and methods
摘要 A stereolithographically fabricated marking for a semiconductor device component, such as a packaged or unpackaged semiconductor device or another substrate. When formed on a semiconductor device with a stereolithographically formed package structure, the marking may be integral with the package. The marking may be formed as apertures through or recesses in one or more stereolithographically fabricated layers of material, or the marking may include one or more stereolithographically fabricated layers that protrude from a surface of a semiconductor device component. Raised markings may also be formed on the surfaces of packaged or bare semiconductor device components. Alternatively, the marking may be fabricated separately from a semiconductor device component, then secured thereto. Methods for stereolithographically marking semiconductor device components are also disclosed. A machine vision system may be used in such methods so as to recognize the position and orientation of a semiconductor device or other substrate to be stereolithographically marked.
申请公布号 US2002018871(A1) 申请公布日期 2002.02.14
申请号 US20000736794 申请日期 2000.12.14
申请人 GRIGG FORD B.;OCKER JAMES M.;LEININGER RICK A. 发明人 GRIGG FORD B.;OCKER JAMES M.;LEININGER RICK A.
分类号 B29C67/00;H01L23/48;H01L23/544;(IPC1-7):B32B27/06 主分类号 B29C67/00
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