| 摘要 |
An apparatus for exposing a wafer to ultraviolet light with a constant intensity emitted from a super-high pressure mercury lamp along an exposure beam path. A shutter opens and closes the exposure beam path. When the mercury lamp cannot be turned off during non-exposure, the mercury lamp is driven to maintain the intensity of the ultraviolet light constant when the shutter is open, and the mercury lamp is driven to maintain current, voltage or power for driving the mercury lamp constant when the shutter is closed, thereby decreasing deterioration in the mercury lamp.
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