| 摘要 |
<p>An electron beam apparatus such as a sheet beam test apparatus includes an electron optical system for irradiating a test object with a primary electron beam from an electron beam source to project an image of a secondary electron beam emitted by the irradiation of the primary electron beam and a sensor for taking the secondary electron beam image projected by the electron optical system. Specifically, the electron beam apparatus comprises beam generation means (2004) for projecting an electron beam having a predetermined width, a primary electron optical system (2001) for directing the beam to the surface of a substrate (2006) to be tested, a secondary electron optical system (2002) for compensating for the secondary electrons generated from the substrate (2006) and for directing the compensated secondary electrons to an image processing system (2015), a stage (2003) for holding the substrate (2006) in a transferable manner with a continuity of at least one degree of freedom, a test chamber for testing the substrate (2006), a substrate transfer mechanism for transferring the substrate (2006) to and from the test chamber, the image processing/analyzing device (2015) for detecting a defect of the substrate (2006), a vacuum system for keeping the vacuum in the test chamber, and a control system (2017) for displaying or storing the position of the defect of the substrate (2006).</p> |
