发明名称 |
HYDROXYPOLYAMIDES AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME |
摘要 |
A photosensitive composition comprising 100 parts by weight of a novel hydroxypolyamide of the general formula (I), 0 to 100 parts by weight of a photoactive component, and a solvent is applied on the surface of a semiconductor device, subjected to patterning, and then cured by heating to form a heat-resistant film such as a surface protective film or a layer-insulation film: (I) wherein X1 is an aromatic group; X2 and X3 are each an organic group; a and b are each a mole fraction and the sum of a and b is 100 mole %, a being 60.0 to 100 mole %; 0 to 50 % of all of D's are each a 1,2-naphthoquinonediazide-4-sulfonic ester residue or a 1,2-naphthoquinonediazide-5-sulfonic ester residue, and the remainder thereof are each hydrogen; and Z is an organic group, with the proviso that when the content of the photoactive component in the composition is 0 part by weight, not all of D's are hydrogen.
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申请公布号 |
WO0212372(A1) |
申请公布日期 |
2002.02.14 |
申请号 |
WO2001JP06763 |
申请日期 |
2001.08.07 |
申请人 |
CLARIANT INTERNATIONAL LTD.;ASAHI KASEI KABUSHIKI KAISHA;NISHIKAWA, MASATO;SASAKI, TAKAHIRO;KATAOKA, YASUHIRO |
发明人 |
NISHIKAWA, MASATO;SASAKI, TAKAHIRO;KATAOKA, YASUHIRO |
分类号 |
C08G69/26;G03F7/023;(IPC1-7):C08G69/26;C08K5/23;C08L77/06;G03F7/022;G03F7/037 |
主分类号 |
C08G69/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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