发明名称 Substrate processing device and method
摘要 A substrate processing device is provided in which an interior rotating body for a substrate holder, provided in the interior of a vacuum chamber, and an external rotating body, provided in the exterior of said vacuum chamber, are magnetically coupled, and which includes a can-seal type magnetic coupling-type rotation introduction mechanism which, by the rotational movement of the abovementioned exterior rotating body, controls the rotational movement of the abovementioned interior rotating body. A heat-accumulating member, maintained at a predetermined temperature, and a device for performing heat exchange between the heat-accumulating member and the substrate holder, are provided in said vacuum chamber interior.
申请公布号 US2002017247(A1) 申请公布日期 2002.02.14
申请号 US20010917916 申请日期 2001.07.31
申请人 SAKAI JUNRO;TAKAHASHI NOBUYUKI 发明人 SAKAI JUNRO;TAKAHASHI NOBUYUKI
分类号 C23C14/50;H01L21/203;H01L21/683;H01L43/12;(IPC1-7):C23C16/00 主分类号 C23C14/50
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