发明名称 METHOD AND DEVICE FOR TREATING WASTE GAS IN SYNTHETIC QUARTZ MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To provide a device for treating a waste gas, which is capable of withstanding the waste gas discharged in a synthetic quartz manufacture, having a high temperature over 200 deg.C and containing silica powder and a hydrogen chloride gas. SOLUTION: The silica powder contained in the waste gas discharged from the manufacturing process of synthetic quartz by gas phase hydrolysis is dust- collected with a ceramic-made filter 4. The filter 4 is cleaned by air blown from the opposed direction to the flow of the waste gas and preferably blown intermittently.
申请公布号 JP2002045628(A) 申请公布日期 2002.02.12
申请号 JP20000238483 申请日期 2000.08.07
申请人 SHIN ETSU CHEM CO LTD 发明人 TSUMURA HIROSHI;MACHIDA HIROSHI;OTSUSAKA TETSUYA
分类号 B01D39/20;B01D46/00;B01D46/42;(IPC1-7):B01D39/20 主分类号 B01D39/20
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