发明名称 |
METHOD AND DEVICE FOR TREATING WASTE GAS IN SYNTHETIC QUARTZ MANUFACTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a device for treating a waste gas, which is capable of withstanding the waste gas discharged in a synthetic quartz manufacture, having a high temperature over 200 deg.C and containing silica powder and a hydrogen chloride gas. SOLUTION: The silica powder contained in the waste gas discharged from the manufacturing process of synthetic quartz by gas phase hydrolysis is dust- collected with a ceramic-made filter 4. The filter 4 is cleaned by air blown from the opposed direction to the flow of the waste gas and preferably blown intermittently.
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申请公布号 |
JP2002045628(A) |
申请公布日期 |
2002.02.12 |
申请号 |
JP20000238483 |
申请日期 |
2000.08.07 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
TSUMURA HIROSHI;MACHIDA HIROSHI;OTSUSAKA TETSUYA |
分类号 |
B01D39/20;B01D46/00;B01D46/42;(IPC1-7):B01D39/20 |
主分类号 |
B01D39/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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