发明名称 ORIGINAL MOLD OF INTAGLIO FOR THICK FILM PATTERN TRANSFER, METHOD FOR MANUFACTURING THE SAME, INTAGLIO FOR THICK FILM PATTERN TRANSFER, METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING THICK FILM PATTERN, BACK SURFACE SUBSTRATE OF PLASMA DISPLAY, METHOD FOR MANUFACTURING THE SAME, PLASMA DISPLAY AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a letterpress becoming the original mold of an intaglio for forming a thick film pattern and holding high detailedness, a high aspect ratio, high positional accuracy and strength. SOLUTION: The letterpress for forming the thick film pattern consists of a substrate and a pattern due to a photosensitive resist. In order to impart sufficient strength to the letterpress, an intermediate layer and a surface coating layer formed by using a metal or a metal oxide are arranged between the substrate and the photosensitive resist pattern, and a resin layer is arranged to the side surface and bottom part of the letterpress.
申请公布号 JP2002046249(A) 申请公布日期 2002.02.12
申请号 JP20010129001 申请日期 2001.04.26
申请人 TOPPAN PRINTING CO LTD 发明人 ONO NAOTO;KATO ISAO;MAEHARA MASATAKA;NAKAMURA RYUICHI
分类号 G03F7/095;B41C3/06;G03F7/11;G03F7/40;H01J9/02;H01J11/22;H01J11/34;H01J11/36;H05K3/12 主分类号 G03F7/095
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