| 摘要 |
PROBLEM TO BE SOLVED: To provide a low shrinking and low water-absorbing photopolymerizable resin composition which is highly sensitive to an ultraviolet radiation, and giving a cured resin having excellent heat resistance, and to provide a manufacturing method. SOLUTION: The photopolymerizable resin composition is composed of (A) a fluorene derivative in general formula (1) wherein R1 to R4 may be same or different and represent a hydrogen atom or an alkyl group of C1-C6, R5 and R6 may be same or different and represent a hydrogen atom or methyl group, n represents an integler 0-10, (C) a polymer having a functional group which can react with an epoxy group, and (B) a photo acid generating agent. |
