| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating method capable of conserving a resist liquid and uniformizing the thickness of a coating film. SOLUTION: A treatment liquid with predetermined viscosity P2 lower than viscosity P1 is discharged after the elapse of time t1 from the start of discharge and a treatment liquid with predetermined viscosity P3 lower than the viscosity P2 is discharged after the elapse of time t2 after the start of the discharge of the treatment liquid and, after the elapse of time tf from the start of discharge, the supply of the treatment liquid to a glass substrate G is stopped. By this constitution, the viscosity of the treatment liquid can be changed corresponding to the region on the glass substrate and the resist liquid consumption can be saved and the thickness of the coating film can be uniformized.
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