发明名称 APPLICATION DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the generation of bubbles in a coating liquid when the overflowing coating liquid is recovered or the coating liquid is supplied and minimize the migration of the generated bubbles into a post-process and thus enable a thin coating film which has no irregularities in the film formation with sufficient film thickness uniformity and homogeneity and is in the submicron order, to be applied to the outer surface of a cylindrical base, in an immersion application method. SOLUTION: In the application device which applies the coating liquid to the outer surface of the cylindrical base by immersing the cylindrical base in the coating liquid in such a state that the cylindrical shaft of the base is retained almost vertically and pulling the cylindrical base out of the coating liquid, a coating liquid circulation mechanism which comprises a coating tank in which the coating liquid is stored and the cylindrical base is immersed, a circulation tank which circulates the coating liquid into the coating tank and feeds the coating liquid into the lower part of the coating tank from the lower part of the circulation tank by means of a pressure feed pump and makes the coating liquid overflow from the upper edge part of the coating tank to send the coating liquid into the circulation tank is provided. In addition, a filter is arranged, facing the upstream side of the coating liquid flow, in piping which guides the overflowing coating liquid to the circulation tank. Besides, the filter is arranged in such a way that it blocks the upper part of the inside diameter of the piping.
申请公布号 JP2002045753(A) 申请公布日期 2002.02.12
申请号 JP20000231494 申请日期 2000.07.31
申请人 KYOCERA MITA CORP 发明人 HENMI MASASHI
分类号 G03G5/05;B05C3/09;B05C11/10;(IPC1-7):B05C3/09 主分类号 G03G5/05
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