发明名称 Solderable thin film
摘要 A copper-gallium alloy is deposited on a nonconductive substrate, such as glass, ceramic, or polymeric material, to provide a conductor to which solder will readily adhere, such that electrical contacts to photonic and electrical components can be made. The copper-gallium thin film can also be used to provide a surface for solder sealing a component within a hermetically sealed enclosure. In a preferred embodiment, the copper-gallium alloy was from about 1 to about 40 percent gallium to about 99 to about 60 percent copper and was deposited to a thickness of from about 400 nanometers to about 3 microns. The copper-gallium film is deposited utilizing sputtering or electron beam deposition equipment.
申请公布号 US6347175(B1) 申请公布日期 2002.02.12
申请号 US19990354361 申请日期 1999.07.14
申请人 CORNING INCORPORATED 发明人 CHEN GANG;KINNEY LYLE DAVID;ONYIRIUKA EMMANUEL C;OUYANG MIKE XU;WELLER-BROPHY LAURA
分类号 C03C17/09;C03C25/22;C03C25/46;C23C14/18;C23C14/22;G02B6/34;G02B6/42;(IPC1-7):G02B6/02;G02B6/36 主分类号 C03C17/09
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