发明名称 MANUFACTURING METHOD OF MICRO INDUCTANCE, AND STRUCTURE OF THE MICRO INDUCTANCE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method and a structure of micro inductance, made of a micro inductance coil in which a magnetic material is plated in the inside. SOLUTION: An inductance base material includes a base 31, an insulating layer 32, a first metal layer 33, a first electric medium layer 34, a barrier layer 35, a second metal layer, an antireflection light beam layer 43, a second electric medium layer 37, a third metal layer 38, a third electric medium layer 39, and a protective layer 41. By using microphoto technique and etching technique, the protective layer 41, the third electric medium layer 39, the third metallic layer 38, and the second electric medium layer 37 are corroded to form a contact window. After the antireflection light beam layer 43 is corroded through the contact window, the second metal layer is corroded through the contact window to form a micro through-path. Finally, micro-electric plating operation is carried out, to grow a high iron magnetic material in the micro through-path, in the manufacturing method of the micro inductance and the structure of the micro inductance. In this way, the sensitiveness and the Q-value of the inductance can be increased, and efficiency of operation is enhanced.
申请公布号 JP2002043155(A) 申请公布日期 2002.02.08
申请号 JP20000201709 申请日期 2000.07.04
申请人 TONRIN HEKIREN 发明人 KAKURIN HEKIREN
分类号 B81B1/00;B81C1/00;H01F17/04;H01F41/04;(IPC1-7):H01F41/04 主分类号 B81B1/00
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