METHOD AND SYSTEM FOR IN SITU CLEANING OFSEMICONDUCTOR MANUFACTURING EQUIPMENT USINGCOMBINATION CHEMISTRIES,申请号KR1020027000480-传众专利搜索

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发明名称	METHOD AND SYSTEM FOR IN SITU CLEANING OFSEMICONDUCTOR MANUFACTURING EQUIPMENT USINGCOMBINATION CHEMISTRIES
摘要
申请公布号	KR20020011454(A)	申请公布日期	2002.02.08
申请号	KR1020027000480	申请日期	2002.01.12
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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