发明名称 SEMICONDUCTOR DEVICE PROVIDED WITH CAPACITOR AND PRODUCTION METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor memory device equipped with a hydrogen diffusion preventing film, which is composed of an oxidized aluminium film, capable of effectively preventing the diffusion of hydrogen generated in a passivation process inside a capacitor, and a production method therefor. SOLUTION: The semiconductor with a capacitor is formed of an active area comprising a transistor and a first insulating film around the transistor; a capacitor structure formed on the first insulating film and comprising a lower electrode, a capacitor thin film on the lower electrode, and an upper electrode on the capacitor thin film; a second insulating film formed on the transistor and the capacitor structure; a metal wiring formed on the second insulating film and electrically connecting the transistor to the capacitor structure; and a hydrogen diffusion preventing film comprising aluminium oxide and formed on the metal wiring.
申请公布号 JP2002043541(A) 申请公布日期 2002.02.08
申请号 JP20010204566 申请日期 2001.07.05
申请人 HYNIX SEMICONDUCTOR INC 发明人 RYO HIRYU;LEE SEUNG-SUK;HONG SUK-KYONG;KYO NANSHU
分类号 H01L27/105;B82B1/00;H01L21/02;H01L21/316;H01L21/768;H01L21/8242;H01L21/8246;H01L27/108 主分类号 H01L27/105
代理机构 代理人
主权项
地址