发明名称 CHARGED PARTICLE BEAM EXPOSURE SYSTEM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam exposure system which can make accurate exposure and transfer even when an MM type linear motor is used for moving a stage. SOLUTION: In a magnetic field correcting device 2, the correction amounts (correction amounts of current values) to be given to the deflector, astigmatism corrector, and focal point correcting coil of a charged particle beam optical system for correcting the values of the rotation, magnification variation, out-of- focus, positional deviations, and aberrations of images caused by the magnetic fields generated by the permanent magnets of the linear motor at every position of the stage are stored at every position of the stage. When the system actually makes exposure, the magnetic field correcting device 2 reads the position of the stage detected by means of a stage position detecting device 5 and corrects the current values given to the deflector, astigmatism corrector, and focal point correcting coil by reading out the correction data corresponding to the position of the stage. Consequently, the system can make accurate exposure and transfer regardless of the position of the linear motor.
申请公布号 JP2002043206(A) 申请公布日期 2002.02.08
申请号 JP20000220153 申请日期 2000.07.21
申请人 NIKON CORP 发明人 FUKUI SAORI;YAMADA ATSUSHI
分类号 G03F7/20;H01J37/153;H01J37/21;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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