| 摘要 |
PROBLEM TO BE SOLVED: To provide an adaptor, a chamber and a plasma treatment device which can improve removal of by-product inside a chamber when the inside of a chamber is subjected to dry cleaning. SOLUTION: A CVD device 1 has a chamber 50 wherein a dome 5 is combined to an upper end of a tubular body 2. The body 2 is provided with a gas inlet 8a whereto film formation gas such as SiH4 is introduced and the dome 5 is provided with a gas inlet 8b. A disc-like adaptor 9 is disposed in opposition in a circumference of the gas inlet 8a in an inner surface of the dome 5. Thereby, a space is formed between the adaptor 9 and the dome 5 and the space becomes a heat insulation layer, thus restraining a temperature drop for the adaptor 9 which is heated once. Thereby, reduction of reactivity between by-product attaching to the adaptor 9 and fluorine radical is prevented and removal efficiency of by-product can be raised.
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