发明名称 |
PLASMA TREATMENT SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To keep constant the status of the wall surface of a vacuum container in a plasma treatment system. SOLUTION: A vacuum container wall 1 is divided electrically insulated by a spacer 2. High frequency electricity generated from a high frequency power source 7 is supplied to a switching circuit 4 to form an ion sheath on the front surface of the wall without being reflected by an impedance matching device 6 and a capacitor 5. Switching circuit 4 supplies high frequency electricity to the divided wall temporally in order. Accumulated coating thickness is controllable by a sputter etching reaction using the ion sheath on the front surface of divided wall 8 to which high frequency electricity is applied. Almost full states of the wall surface of the vacuum container which plasma contacts are controllable by switching divided wall 8 to which high frequency electricity is applied in order with a certain span. |
申请公布号 |
JP2002043235(A) |
申请公布日期 |
2002.02.08 |
申请号 |
JP20000229185 |
申请日期 |
2000.07.28 |
申请人 |
TOHOKU TECHNO ARCH CO LTD |
发明人 |
SATO NORIYOSHI;IIZUKA SATORU |
分类号 |
H05H1/46;C23F4/00;H01L21/205;H01L21/302;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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