发明名称 PLASMA TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To keep constant the status of the wall surface of a vacuum container in a plasma treatment system. SOLUTION: A vacuum container wall 1 is divided electrically insulated by a spacer 2. High frequency electricity generated from a high frequency power source 7 is supplied to a switching circuit 4 to form an ion sheath on the front surface of the wall without being reflected by an impedance matching device 6 and a capacitor 5. Switching circuit 4 supplies high frequency electricity to the divided wall temporally in order. Accumulated coating thickness is controllable by a sputter etching reaction using the ion sheath on the front surface of divided wall 8 to which high frequency electricity is applied. Almost full states of the wall surface of the vacuum container which plasma contacts are controllable by switching divided wall 8 to which high frequency electricity is applied in order with a certain span.
申请公布号 JP2002043235(A) 申请公布日期 2002.02.08
申请号 JP20000229185 申请日期 2000.07.28
申请人 TOHOKU TECHNO ARCH CO LTD 发明人 SATO NORIYOSHI;IIZUKA SATORU
分类号 H05H1/46;C23F4/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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