| 摘要 |
PROBLEM TO BE SOLVED: To provide water and a method for keeping silicon wafer by which the deterioration of the quality of a silicon wafer, such as of the oxide-film withstand voltage, etc., can be prevented by preventing the surface of the wafer from being contaminated with Cu and, in addition, such a metal as Al, etc., which has not been prevented by the conventional keeping water. SOLUTION: At the time of keeping the silicon wafer in pure water, hydrogen peroxide and a citric acid are added to the pure water. |
