| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method and a device for a shadow mask, capable of preventing generation of unevenness such as a wind ripple on the surface of a photoresist film. SOLUTION: In hot air drying after photoresist coating, a pressure reduced chamber 99 partitioned with two mesh-shaped straightening vanes 95, 97 having different hole diameters are installed inside an air outlet. |
