| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for scanning exposure by which multiple exposure can be performed even by means of a step-and-scan projection aligner and the coherence factor and exposure of a lighting system can be adjusted at every focal point needed for optimizing the multiple exposure and, in addition, the accuracy of pattern transfer can be improved. SOLUTION: In the method for scanning exposure in which the projection area of a mask 11 is limited by means of a slit 15 at the time of transferring a pattern formed on the mask 11 to a wafer 14 through a projection lens 13 and the whole pattern area of the mask 11 is transferred to the wafer 14 by synchronously scanning the mask 11 and wafer 14 in a state where the slit 15 is fixed, the exposure of the whole mask which is performed by scanning the mask 11 and wafer 14 is performed twice by changing the exposing conditions and, in addition, the scanning directions of the mask 11 and wafer 14 at the time of performing the second exposure are reversed from those at the time of performing the first exposure. |
