| 摘要 |
PROBLEM TO BE SOLVED: To clean the inside of a semiconductor manufacturing apparatus using a low-cost facility, while reducing the installation space for the equipment. SOLUTION: A ceiling part 12a of a cassette transfer chamber 12 of a semiconductor manufacturing apparatus 10 is provided with an air intake 18 comprising a network-like member, while a bottom part 12b of the cassette transfer chamber 12 is provided with an exhaust fan 20. The down-flow in a clean room is taken in the cassette transfer chamber 12 through the air intake 18, while a down flow 21 flowing inside the cassette transfer chamber 12 from the exhaust fan 20 is exhausted to the outside, and a wafer transfer chamber 14 is provided with a clean unit 26, so that clean air 28 is circulated in the wafer transfer chamber 14. |
