| 发明名称 |
Polishing pad and method for manufacturing the same |
| 摘要 |
An object of the present invention is to provide a polishing pad capable of obtaining the stabilized polishing performance and a method for manufacturing the same. The polishing pad according to the present invention is characterized in that cut surfaces of not less than one kind of sheets are arranged spirally on the polishing surface of the polishing pad. |
| 申请公布号 |
US2002016145(A1) |
申请公布日期 |
2002.02.07 |
| 申请号 |
US20010910013 |
申请日期 |
2001.07.23 |
| 申请人 |
ROKITECHNO CO., LTD. |
发明人 |
TOMINAGA SHIGERU;SUZUKI MAKOTO |
| 分类号 |
B24B37/00;B24B37/04;B24B37/20;B24B37/22;B24D11/00;H01L21/304;(IPC1-7):B24D11/00 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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