发明名称 |
PLASMA DEPOSITED BARRIER COATING COMPRISING AN INTERFACE LAYER, METHOD FOR OBTAINING SAME AND CONTAINER COATED THEREWITH |
摘要 |
<p>The invention concerns in particular a method using a low pressure plasma for depositing a barrier coating on a substrate to be treated, wherein the plasma is obtained by partial ionisation, under the action of an electromagnetic field, of a reaction fluid injected under low pressure in a treating zone. The method is characterised in that it comprises at least a step which consists in depositing on the substrate an interface layer which is obtained by bringing to plasma state a mixture comprising at least an organosilicon compound and a nitrogenous compound, and a step which consists in depositing, on the interface layer, a barrier layer, essentially consisting of a silicon oxide of formula SiOx.</p> |
申请公布号 |
WO0209891(A1) |
申请公布日期 |
2002.02.07 |
申请号 |
WO2001FR02368 |
申请日期 |
2001.07.20 |
申请人 |
SIDEL;BELDI, NASSER;ADRIANSENS, ERIC |
发明人 |
BELDI, NASSER;ADRIANSENS, ERIC |
分类号 |
B65D23/02;B05D3/04;B05D7/22;B05D7/24;C08J7/06;C23C16/04;C23C16/42;C23C16/511;(IPC1-7):B05D7/24;B05D7/00 |
主分类号 |
B65D23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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